The global Plasma Etch System market was valued at 379.71 Million USD in 2021 and will grow with a CAGR of 12.3% from 2021 to 2027, based on HNY Research newly published report.

The prime objective of this report is to provide the insights on the post COVID-19 impact which will help market players in this field evaluate their business approaches. Also, this report covers market segmentation by major market verdors, types, applications/end users and geography(North America, East Asia, Europe, South Asia, Southeast Asia, Middle East, Africa, Oceania, South America).

This report studies the Plasma Etch System market. Plasma Etching System is a series of devices and equipment used together to perform plasma etching. Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target. North America ranks the top in terms of global market size of Plasma Etch System, it consists of 48.57% of the international market in 2016. Japan comes the second, with 20.03% of the global market. Europe consists of 12.51% of the Plasma Etch System market in the same year, the other regions all together consist of 8.81%. Applied Materials, Inc. ranks the first in terms of revenue share in Global market of Plasma Etch System, occupies 24.12% of market share in 2016; While, Lam Research, with a market share of 22.89%, comes the second; Tokyo Electron Limited, with a market share of 17.36% in 2016, comes the third. All the other manufacturers which are not included in the report together consist of approximately 27.02% of the global market in 2016.

By Market Verdors:

Oxford Instruments

ULVAC

Lam Research

AMEC

PlasmaTherm

SAMCO Inc.

Applied Materials, Inc.

Sentech

SPTS Technologies (an Orbotech Company)

GigaLane

CORIAL

Trion Technology

NAURA

Plasma Etch, Inc.

Tokyo Electron Limited

By Types:

Inductively Coupled Plasma (ICP)

Reactive Ion Etching (RIE)

Deep Reactive Ion Etching (DRIE)

By Applications:

Semiconductor Industry

Medical Industry

Electronics & Microelectronics

Key Indicators Analysed

Market Players & Competitor Analysis: The report covers the key players of the industry including Company Profile, Product Specifications, Production Capacity/Sales, Revenue, Price and Gross Margin 2016-2027 & Sales with a thorough analysis of the market’s competitive landscape and detailed information on vendors and comprehensive details of factors that will challenge the growth of major market vendors.

Global and Regional Market Analysis: The report includes Global & Regional market status and outlook 2016-2027. Further the report provides break down details about each region & countries covered in the report. Identifying its sales, sales volume & revenue forecast. With detailed analysis by types and applications.

Market Trends: Market key trends which include Increased Competition and Continuous Innovations.

Opportunities and Drivers: Identifying the Growing Demands and New Technology

Porters Five Force Analysis: The report provides with the state of competition in industry depending on five basic forces: threat of new entrants, bargaining power of suppliers, bargaining power of buyers, threat of substitute products or services, and existing industry rivalry.

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